TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters

Bibliographic Details
Main Authors:	Logothetidis, S., Alexandrou, J.
Format:	Article
Language:	English
Published:	De Gruyter 1995-12-01
Series:	Journal of the Mechanical Behavior of Materials
Online Access:	https://doi.org/10.1515/JMBM.1995.6.1.31

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spelling	doaj-e80def12585140d18e1fc0dea64fb55e2021-10-02T19:14:33ZengDe GruyterJournal of the Mechanical Behavior of Materials0334-89382191-02431995-12-0161314010.1515/JMBM.1995.6.1.31TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition ParametersLogothetidis, S.Alexandrou, J.https://doi.org/10.1515/JMBM.1995.6.1.31
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Logothetidis, S. Alexandrou, J.
spellingShingle	Logothetidis, S. Alexandrou, J. TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters Journal of the Mechanical Behavior of Materials
author_facet	Logothetidis, S. Alexandrou, J.
author_sort	Logothetidis, S.
title	TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
title_short	TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
title_full	TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
title_fullStr	TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
title_full_unstemmed	TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
title_sort	tinx thin films deposited by reactive magnetron sputtering: in-situ monitoring and effect of deposition parameters
publisher	De Gruyter
series	Journal of the Mechanical Behavior of Materials
issn	0334-8938 2191-0243
publishDate	1995-12-01
url	https://doi.org/10.1515/JMBM.1995.6.1.31
work_keys_str_mv	AT logothetidiss tinxthinfilmsdepositedbyreactivemagnetronsputteringinsitumonitoringandeffectofdepositionparameters AT alexandrouj tinxthinfilmsdepositedbyreactivemagnetronsputteringinsitumonitoringandeffectofdepositionparameters
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TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters

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