TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
1995-12-01
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| Series: | Journal of the Mechanical Behavior of Materials |
| Online Access: | https://doi.org/10.1515/JMBM.1995.6.1.31 |