Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering

Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering

Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are d...

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Bibliographic Details
Main Authors: D.O. Kharchenko, V.O. Kharchenko
Format: Article
Language:English
Published: Institute for Condensed Matter Physics 2011-06-01
Series:Condensed Matter Physics
Subjects:
ion-beam sputtering
surface morphology
nanoscale structures
Online Access:http://dx.doi.org/10.5488/CMP.14.23602
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spelling doaj-e6e68bcef7be4da69c27f6499438935a2020-11-24T20:56:21ZengInstitute for Condensed Matter PhysicsCondensed Matter Physics1607-324X2011-06-0114223602Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputteringD.O. KharchenkoV.O. KharchenkoTwo-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roughness exponents in different domains of the phase diagram are obtained.http://dx.doi.org/10.5488/CMP.14.23602ion-beam sputteringsurface morphologynanoscale structures
collection DOAJ
language English
format Article
sources DOAJ
author D.O. Kharchenko
V.O. Kharchenko
spellingShingle D.O. Kharchenko
V.O. Kharchenko
Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
Condensed Matter Physics
ion-beam sputtering
surface morphology
nanoscale structures
author_facet D.O. Kharchenko
V.O. Kharchenko
author_sort D.O. Kharchenko
title Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
title_short Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
title_full Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
title_fullStr Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
title_full_unstemmed Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
title_sort morphology change of the silicon surface induced by ar<sup>+</sup> ion beam sputtering
publisher Institute for Condensed Matter Physics
series Condensed Matter Physics
issn 1607-324X
publishDate 2011-06-01
description Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roughness exponents in different domains of the phase diagram are obtained.
topic ion-beam sputtering
surface morphology
nanoscale structures
url http://dx.doi.org/10.5488/CMP.14.23602
work_keys_str_mv AT dokharchenko morphologychangeofthesiliconsurfaceinducedbyarsupsupionbeamsputtering
AT vokharchenko morphologychangeofthesiliconsurfaceinducedbyarsupsupionbeamsputtering
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