Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are d...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Institute for Condensed Matter Physics
2011-06-01
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| Series: | Condensed Matter Physics |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.5488/CMP.14.23602 |