Fast and Automatic Control of a Frequency-Tuned Radiofrequency Plasma Source

A frequency-tuned radiofrequency (rf) plasma source is automatically controlled to minimize the rf power reflection and to maintain the constant net rf power corresponding to the forward power minus the reflected power. The experiment is performed with a power amplifier operational for the frequency...

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Bibliographic Details
Main Authors: Kazunori Takahashi, Kengo Hanaoka, Akira Ando
Format: Article
Language:English
Published: Frontiers Media S.A. 2020-01-01
Series:Frontiers in Physics
Subjects:
Online Access:https://www.frontiersin.org/article/10.3389/fphy.2019.00227/full