Optical Analysis of RF Sputtering Plasma through Colour Characterization
The photometric properties of an radio frequency (RF)-based sputtering plasma source were monitored through optical spectroscopy. The colour of the plasma source was deduced based on conventional chromaticity index analysis and it was compared to the direct spectral data plots of the emission peaks...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-05-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/9/5/315 |