Ion-beam irradiation effects on reactively sputtered CrN layers
This paper presents a study of microstructural changes induced in CrN layers by irradiation with 120 keV argon ions. The layers were deposited on (100) Si wafers, at different nitrogen partial pressures (2×10^-4, 3.5×10^-4 and 5×10^-4 mbar), to a total thickness of 260–280 nm. During deposition the...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
University of Novi Sad
2011-03-01
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| Series: | Processing and Application of Ceramics |
| Subjects: | |
| Online Access: | http://www.tf.uns.ac.rs/publikacije/PAC/pdf/PAC%2011%2004.pdf |