Strain field determination in III–V heteroepitaxy coupling finite elements with experimental and theoretical techniques at the nanoscale
We are briefly reviewing the current status of elastic strain field determination in III–V heteroepitaxial nanostructures, linking finite elements (FE) calculations with quantitative nanoscale imaging and atomistic calculation techniques. III–V semiconductor nanostructure systems of various dimensio...
Main Authors: | Florini Nikoletta, Dimitrakopulos George P., Kioseoglou Joseph, Pelekanos Nikos T., Kehagias Thomas |
---|---|
Format: | Article |
Language: | English |
Published: |
De Gruyter
2017-04-01
|
Series: | Journal of the Mechanical Behavior of Materials |
Subjects: | |
Online Access: | https://doi.org/10.1515/jmbm-2017-0009 |
Similar Items
-
Effect of imaging conditions for reliable measurement of local strain from synthetic High Resolution Transmission Electron Microscope (HRTEM) images by Geometrical Phase Analysis (GPA)
by: Rajagopalan, Srivaramangai
Published: (2010) -
Nanostructure Quantification of Carbon Blacks
by: Madhu Singh, et al.
Published: (2018-12-01) -
The Role of III-V Substrate Roughness and Deoxidation Induced by Digital Etch in Achieving Low Resistance Metal Contacts
by: Florent Ravaux, et al.
Published: (2017-06-01) -
On the Application of Electron Energy-Loss Spectroscopy for Investigating Nanostructure of Soot from Different Fuels
by: Carmela Russo, et al.
Published: (2021-09-01) -
Strain Relief Analysis of InN Quantum Dots Grown on GaN
by: Ruffenach Sandra, et al.
Published: (2007-01-01)