Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth

We report on the reproducible growth of two inch 3C-SiC crystals using the transfer of chemical vapor deposition (CVD)-grown (100) oriented epitaxial layers. Additional experiments, in which the diameter of the free-standing layers is increased, are presented, indicating the upscale potential of thi...

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Main Authors: Philipp Schuh, Francesco La Via, Marco Mauceri, Marcin Zielinski, Peter J. Wellmann
Format: Article
Language:English
Published: MDPI AG 2019-07-01
Series:Materials
Subjects:
PVT
Online Access:https://www.mdpi.com/1996-1944/12/13/2179
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spelling doaj-dc900fad270548338369b4aaf252e55d2020-11-24T20:43:51ZengMDPI AGMaterials1996-19442019-07-011213217910.3390/ma12132179ma12132179Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase GrowthPhilipp Schuh0Francesco La Via1Marco Mauceri2Marcin Zielinski3Peter J. Wellmann4Crystal Growth Lab, Materials Department 6 (i-meet), FAU Erlangen-Nuremberg, Martensstr. 7, D-91058 Erlangen, GermanyCNR-IMM, sezione di Catania, Stradale Primosole 50, I-95121 Catania, ItalyLPE S.P.A., Sedicesima Strada, I-95121 Catania, ItalyNOVASiC, Savoie Technolac, BP267, F-73375 Le Bourget-du-Lac Cedex, FranceCrystal Growth Lab, Materials Department 6 (i-meet), FAU Erlangen-Nuremberg, Martensstr. 7, D-91058 Erlangen, GermanyWe report on the reproducible growth of two inch 3C-SiC crystals using the transfer of chemical vapor deposition (CVD)-grown (100) oriented epitaxial layers. Additional experiments, in which the diameter of the free-standing layers is increased, are presented, indicating the upscale potential of this process. The nucleation and growth of cubic silicon carbide is supported by XRD and Raman measurements. The rocking curve data yield a full-width-at-half-maximum (FWHM) between 138 to 140 arc sec for such grown material. Analysis of the inbuilt stress of the bulk-like material shows no indications of any residual stress.https://www.mdpi.com/1996-1944/12/13/21793C-SiCPVTsublimation sandwichstress-freebulklarge area
collection DOAJ
language English
format Article
sources DOAJ
author Philipp Schuh
Francesco La Via
Marco Mauceri
Marcin Zielinski
Peter J. Wellmann
spellingShingle Philipp Schuh
Francesco La Via
Marco Mauceri
Marcin Zielinski
Peter J. Wellmann
Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
Materials
3C-SiC
PVT
sublimation sandwich
stress-free
bulk
large area
author_facet Philipp Schuh
Francesco La Via
Marco Mauceri
Marcin Zielinski
Peter J. Wellmann
author_sort Philipp Schuh
title Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
title_short Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
title_full Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
title_fullStr Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
title_full_unstemmed Growth of Large-Area, Stress-Free, and Bulk-Like 3C-SiC (100) Using 3C-SiC-on-Si in Vapor Phase Growth
title_sort growth of large-area, stress-free, and bulk-like 3c-sic (100) using 3c-sic-on-si in vapor phase growth
publisher MDPI AG
series Materials
issn 1996-1944
publishDate 2019-07-01
description We report on the reproducible growth of two inch 3C-SiC crystals using the transfer of chemical vapor deposition (CVD)-grown (100) oriented epitaxial layers. Additional experiments, in which the diameter of the free-standing layers is increased, are presented, indicating the upscale potential of this process. The nucleation and growth of cubic silicon carbide is supported by XRD and Raman measurements. The rocking curve data yield a full-width-at-half-maximum (FWHM) between 138 to 140 arc sec for such grown material. Analysis of the inbuilt stress of the bulk-like material shows no indications of any residual stress.
topic 3C-SiC
PVT
sublimation sandwich
stress-free
bulk
large area
url https://www.mdpi.com/1996-1944/12/13/2179
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