Unsupervised Pre-Training of Imbalanced Data for Identification of Wafer Map Defect Patterns
Visual defect inspection and classification are significant steps of most manufacturing processes in the semiconductor and electronics industries. Known and unknown defects on wafer maps tend to cluster, and these spatial patterns provide valuable process information for supporting manufacturing in...
Main Authors: | , , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2021-01-01
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Series: | IEEE Access |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/9385104/ |