Effect of Dopant Compensation on the Behavior of Dissolved Iron and Iron-Boron Related Complexes in Silicon

The behavior of iron, iron-boron (FeB) pairs, and iron-boron-phosphorus (FeB-P) complexes has been studied in B-doped Czochralski silicon with phosphorus (P) compensation and compared with that in uncompensated material. The interstitial iron concentration has been measured at temperatures from 50 t...

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Bibliographic Details
Main Authors: Xiaodong Zhu, Xuegong Yu, Peng Chen, Yong Liu, Jan Vanhellemont, Deren Yang
Format: Article
Language:English
Published: Hindawi Limited 2015-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2015/154574