Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy

Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy

This paper treats a problem of nonstoichiometry in TiO2−y thin films deposited by reactive sputtering at controlled sputtering rates. Ion beam techniques, Rutherford backscattering (RBS), and nuclear reaction analysis (NRA) along with X-ray photoelectron spectroscopy have been applied to determine a...

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Main Author: K. Zakrzewska
Format: Article
Language:English
Published: Hindawi Limited 2012-01-01
Series:Advances in Materials Science and Engineering
Online Access:http://dx.doi.org/10.1155/2012/826873
id doaj-d7410ba5fcb44653b1b2c7ef5659b1bc
record_format Article
spelling doaj-d7410ba5fcb44653b1b2c7ef5659b1bc2020-11-24T23:00:04ZengHindawi LimitedAdvances in Materials Science and Engineering1687-84341687-84422012-01-01201210.1155/2012/826873826873Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron SpectroscopyK. Zakrzewska0Faculty of Electrical Engineering, Automatics, Computer Science and Electronics, AGH University of Science and Technology, 30 Mickiewicza Avenue, 30-059 Kraków, PolandThis paper treats a problem of nonstoichiometry in TiO2−y thin films deposited by reactive sputtering at controlled sputtering rates. Ion beam techniques, Rutherford backscattering (RBS), and nuclear reaction analysis (NRA) along with X-ray photoelectron spectroscopy have been applied to determine a deviation from stoichiometry y in the bulk and at the surface of TiO2−y layers. The critical review of these experimental methods is given. Defect structure responsible for the electrical resistivity of rutile TiO2 is discussed.http://dx.doi.org/10.1155/2012/826873
collection DOAJ
language English
format Article
sources DOAJ
author K. Zakrzewska
spellingShingle K. Zakrzewska
Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
Advances in Materials Science and Engineering
author_facet K. Zakrzewska
author_sort K. Zakrzewska
title Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
title_short Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
title_full Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
title_fullStr Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
title_full_unstemmed Nonstoichiometry in TiO2−y Studied by Ion Beam Methods and Photoelectron Spectroscopy
title_sort nonstoichiometry in tio2−y studied by ion beam methods and photoelectron spectroscopy
publisher Hindawi Limited
series Advances in Materials Science and Engineering
issn 1687-8434
1687-8442
publishDate 2012-01-01
description This paper treats a problem of nonstoichiometry in TiO2−y thin films deposited by reactive sputtering at controlled sputtering rates. Ion beam techniques, Rutherford backscattering (RBS), and nuclear reaction analysis (NRA) along with X-ray photoelectron spectroscopy have been applied to determine a deviation from stoichiometry y in the bulk and at the surface of TiO2−y layers. The critical review of these experimental methods is given. Defect structure responsible for the electrical resistivity of rutile TiO2 is discussed.
url http://dx.doi.org/10.1155/2012/826873
work_keys_str_mv AT kzakrzewska nonstoichiometryintio2ystudiedbyionbeammethodsandphotoelectronspectroscopy
_version_ 1725642851344187392

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