Silicon Nitride/Silicon Dioxide Echelle Grating Spectrometer for Operation Near 1.55 μm

Silicon Nitride/Silicon Dioxide Echelle Grating Spectrometer for Operation Near 1.55 μm

Here we use an electron beam lithography system to pattern an Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> echelle grating using silver as a reflector on the grating grooves. The grating in this letter achieves 1.39 dB on-chip loss, a spectral resolution of ~1300,...

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Bibliographic Details
Main Authors: Shengjie Xie, Yang Meng, Joss Bland-Hawthorn, Sylvain Veilleux, Mario Dagenais
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Photonics Journal
Subjects:
nanophotonics
spectroscopy
demultiplexing
Online Access:https://ieeexplore.ieee.org/document/8538877/

Internet

https://ieeexplore.ieee.org/document/8538877/

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