Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network

In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process. Even if a layout passes the design rule checking (DRC), i...

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Bibliographic Details
Main Authors: Xingyu Zhou, Youling Yu
Format: Article
Language:English
Published: JommPublish 2018-12-01
Series:Journal of Microelectronic Manufacturing
Subjects:
cnn
Online Access:http://www.jommpublish.org/p/21/

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