Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network
In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process. Even if a layout passes the design rule checking (DRC), i...
Main Authors: | Xingyu Zhou, Youling Yu |
---|---|
Format: | Article |
Language: | English |
Published: |
JommPublish
2018-12-01
|
Series: | Journal of Microelectronic Manufacturing |
Subjects: | |
Online Access: | http://www.jommpublish.org/p/21/ |
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