Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network

Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network

In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process. Even if a layout passes the design rule checking (DRC), i...

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Bibliographic Details
Main Authors: Xingyu Zhou, Youling Yu
Format: Article
Language:English
Published: JommPublish 2018-12-01
Series:Journal of Microelectronic Manufacturing
Subjects:
lithography
hotspot detection
cnn
deep learning
Online Access:http://www.jommpublish.org/p/21/

Internet

http://www.jommpublish.org/p/21/

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