Oxygen source-oriented control of atmospheric pressure chemical vapor deposition of VO2 for capacitive applications
Vanadium dioxides of different crystalline orientation planes have successfully been fabricated by chemical vapor deposition at atmospheric pressure using propanol, ethanol and O2 gas as oxygen sources. The thick a-axis textured monoclinic vanadium dioxide obtained through propanol presented the be...
Main Authors: | Dimitra Vernardou, Antonia Bei, Dimitris Louloudakis, Nikolaos Katsarakis, Emmanouil Koudoumas |
---|---|
Format: | Article |
Language: | English |
Published: |
International Association of Physical Chemists (IAPC)
2016-06-01
|
Series: | Journal of Electrochemical Science and Engineering |
Subjects: | |
Online Access: | http://pub.iapchem.org/ojs/index.php/JESE/article/view/278 |
Similar Items
-
Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material
by: Dimitra Vernardou
Published: (2017-02-01) -
Growth without Postannealing of Monoclinic VO<sub>2</sub> Thin Film by Atomic Layer Deposition Using VCl<sub>4</sub> as Precursor
by: Wen-Jen Lee, et al.
Published: (2018-11-01) -
Carbon, magnesium implantation and proton irradiation on pulsed laser deposited thermochromic thin film of VO2
by: Mabakachaba, Boitumelo Mafalo
Published: (2020) -
Microwave-assisted synthesis of nanoscale VO2 structures
by: Matthias Van Zele, et al.
Published: (2021-09-01) -
Suppression of Graphene Nucleation by Turning Off Hydrogen Supply Just before Atmospheric Pressure Chemical Vapor Deposition Growth
by: Seiya Suzuki, et al.
Published: (2017-11-01)