Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system
We report a flexible and efficient method to pattern two-dimensional (2D) multi-scale structures by digital-mask projective lithography (DMPL) with an alterable projective scaling system. In the developed DMPL system, femtosecond laser was modulated by digital micromirror device (DMD) to generate a...
| Main Authors: | , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2018-06-01
|
| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5030585 |