Si<sub>3</sub>N<sub>4</sub> recubierto con diamante CVD mediante filamento caliente y plasma generado por microondas

Silicon nitride substrates have been diamond coated by hot-filament (home made) and microwave plasma (commercial) CVD reactors. The importance of Si3N4 as substrate relies on its favoured adhesion to the diamond film, as required in wear applications. Diamond coatings have been characterized by μ-Ra...

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Bibliographic Details
Main Authors: Belmonte, M., Costa, F. M., Fernandes, A. J. S., Oliveira, F. J., Tallaire, A., Silva, R. F.
Format: Article
Language:English
Published: Elsevier 2004-04-01
Series:Boletín de la Sociedad Española de Cerámica y Vidrio
Subjects:
Online Access:http://ceramicayvidrio.revistas.csic.es/index.php/ceramicayvidrio/article/view/572/592