Manufacturing technology for contacts to silicon carbide

The authors classified the results of investigations of resistivity of ohmic contacts to silicon carbide made without any semiconductor surface modification. A set of contacts with better parameters were analysed. From the results of this analysis, some recommendations were made concerning optimal c...

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Bibliographic Details
Main Authors: Kudryk Ya.Ya., Bigun R. I., Kudryk R. Ya.
Format: Article
Language:English
Published: Politehperiodika 2013-02-01
Series:Tekhnologiya i Konstruirovanie v Elektronnoi Apparature
Subjects:
SiC
Online Access:http://www.tkea.com.ua/tkea/2013/1_2013/pdf/05.zip
Description
Summary:The authors classified the results of investigations of resistivity of ohmic contacts to silicon carbide made without any semiconductor surface modification. A set of contacts with better parameters were analysed. From the results of this analysis, some recommendations were made concerning optimal contact-forming layers for p- and n-SiC types of 4H, 6H, 3C, 15R, 21R polytypes.
ISSN:2225-5818