Dynamic characteristics after bias stress of GaN HEMTs with field plate on free‐standing GaN substrate

Abstract This paper investigates the electron trapping behaviour after bias stress in GaN high‐electron‐mobility transistors (HEMTs) fabricated on GaN substrate. On‐resistance (RON) and electron‐trap‐induced threshold voltage shift (ΔVth) of GaN HEMTs on GaN substrate are determined by gate quiescen...

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Bibliographic Details
Main Authors: Qiang Ma, Yuji Ando, Akio Wakejima
Format: Article
Language:English
Published: Wiley 2021-07-01
Series:Electronics Letters
Online Access:https://doi.org/10.1049/ell2.12201