TSF-MOCVD – a novel technique for chemical vapour deposition on oxide thin films and layered heterostructures

A new principle for supplying volatile precursors to MOCVD gas-phase chemical deposition systems is proposed, based on a two-stage evaporation of an organic solution of precursors from a soaked cotton thread, which passes sequentially through the zones of evaporation of the solvent and precursors. T...

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Bibliographic Details
Main Authors: Andrey R. Kaul, Roy R. Nygaard, Vadim Yu. Ratovskiy, Alexander L. Vasiliev
Format: Article
Language:English
Published: Voronezh State University 2021-09-01
Series:Конденсированные среды и межфазные границы
Subjects:
tsf
Online Access:https://journals.vsu.ru/kcmf/article/view/3531