A Study on the Transition of Copper Oxide by the Incorporation of Nitrogen

In the present study, the effects of nitrogen incorporation on the transition of a p-type copper oxide semiconductor are investigated. The properties of sputtered copper oxide and nitrogen-incorporated copper oxide are evaluated and compared at various nitrogen gas flow rates. The results indicate t...

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Bibliographic Details
Main Authors: Song-Yi Ahn, Kyung Park, Daehwan Choi, Jozeph Park, Yong Joo Kim, Hyun-Suk Kim
Format: Article
Language:English
Published: MDPI AG 2019-09-01
Series:Electronics
Subjects:
Online Access:https://www.mdpi.com/2079-9292/8/10/1099
Description
Summary:In the present study, the effects of nitrogen incorporation on the transition of a p-type copper oxide semiconductor are investigated. The properties of sputtered copper oxide and nitrogen-incorporated copper oxide are evaluated and compared at various nitrogen gas flow rates. The results indicate that the addition of nitrogen results in an increased optical bandgap, accompanied by significantly reduced tail states compared to pristine copper oxide. In addition, X-ray diffraction and X-ray photoelectron spectroscopy reveal that the incorporation of nitrogen stimulates the transition from copper (II) oxide to copper (I) oxide.
ISSN:2079-9292