Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere

Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere

Abstract Acquiring the optimum growth conditions of Ti-Al-N films, the effects of gas atmosphere, especially the reactive plasma on the material microstructures, and mechanical properties are still a fundamental and important issue. In this study, Ti-Al-N films are reactively deposited by radio freq...

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Bibliographic Details
Main Authors: Dongke Li, Lixia Xia, Lian Yan, Yunqing Cao, Zhangyin Zhai, Guibin Chen
Format: Article
Language:English
Published: SpringerOpen 2020-05-01
Series:Nanoscale Research Letters
Subjects:
Ti-Al-N
Nitrogen plasma density
RF-ICPIS
microstructure
Online Access:http://link.springer.com/article/10.1186/s11671-020-03354-5

Internet

http://link.springer.com/article/10.1186/s11671-020-03354-5

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