Comparison of the Physicochemical Properties of TiO<sub>2</sub> Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Comparison of the Physicochemical Properties of TiO<sub>2</sub> Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

In this paper, a comparison of TiO<sub>2</sub> thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of mea...

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Bibliographic Details
Main Authors: Artur Wiatrowski, Michał Mazur, Agata Obstarczyk, Damian Wojcieszak, Danuta Kaczmarek, Jerzy Morgiel, Des Gibson
Format: Article
Language:English
Published: MDPI AG 2018-11-01
Series:Coatings
Subjects:
gas impulse magnetron sputtering
thin films
TiO<sub>2</sub>
microstructure
surface properties
optical properties
mechanical properties
hardness
scratch resistance
Online Access:https://www.mdpi.com/2079-6412/8/11/412

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https://www.mdpi.com/2079-6412/8/11/412

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