Plastic deformation in nanostructure silicon formation
The quantity and quality analysis of plastic deformation and near-surface silicon layers with nanostructure silicon formation are given in this paper. It is shown, due to high-temperature oxidation and other factors the complex defect structure is generated in near-surface silicon layers. It consist...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
Politehperiodika
2011-04-01
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Series: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
Subjects: | |
Online Access: | http://www.tkea.com.ua/tkea/2011/1-2_2011/pdf/07.zip |
Summary: | The quantity and quality analysis of plastic deformation and near-surface silicon layers with nanostructure silicon formation are given in this paper. It is shown, due to high-temperature oxidation and other factors the complex defect structure is generated in near-surface silicon layers. It consists of a disordered silicon layer and a layer of dislocation networks. Silicon dioxide etching and additional chemical treatment allows to obtain nanostructured silicon with given properties. |
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ISSN: | 2225-5818 |