Plastic deformation in nanostructure silicon formation

The quantity and quality analysis of plastic deformation and near-surface silicon layers with nanostructure silicon formation are given in this paper. It is shown, due to high-temperature oxidation and other factors the complex defect structure is generated in near-surface silicon layers. It consist...

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Bibliographic Details
Main Authors: Smyntyna V. A., Kulinich O. A., Yatsunkiy I. R.
Format: Article
Language:English
Published: Politehperiodika 2011-04-01
Series:Tekhnologiya i Konstruirovanie v Elektronnoi Apparature
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Online Access:http://www.tkea.com.ua/tkea/2011/1-2_2011/pdf/07.zip
Description
Summary:The quantity and quality analysis of plastic deformation and near-surface silicon layers with nanostructure silicon formation are given in this paper. It is shown, due to high-temperature oxidation and other factors the complex defect structure is generated in near-surface silicon layers. It consists of a disordered silicon layer and a layer of dislocation networks. Silicon dioxide etching and additional chemical treatment allows to obtain nanostructured silicon with given properties.
ISSN:2225-5818