Global Source Optimisation Based on Adaptive Nonlinear Particle Swarm Optimisation Algorithm for Inverse Lithography

Global Source Optimisation Based on Adaptive Nonlinear Particle Swarm Optimisation Algorithm for Inverse Lithography

Source optimisation (SO) is an approved approach to improve the imaging quality in inverse lithography techniques. It is critical to apply an optimisation approach with high convergence efficiency and minimum errors in pixel-based SO. To improve the convergence efficiency of the pixel-based SO, a ro...

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Bibliographic Details
Main Authors: Haifeng Sun, Jing Du, Chuan Jin, Jinhua Feng, Jian Wang, Song Hu, Junbo Liu
Format: Article
Language:English
Published: IEEE 2021-01-01
Series:IEEE Photonics Journal
Subjects:
Source optimisation
particle swarm optimisation algorithm
adaptive nonlinear control strategy
inverse lithography techniques
Online Access:https://ieeexplore.ieee.org/document/9508817/

Internet

https://ieeexplore.ieee.org/document/9508817/

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