Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering

Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering

<p>Abstract</p> <p>In this article, we present an investigation of (Ge + SiO<sub>2</sub>)/SiO<sub>2 </sub>multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transm...

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Main Authors: Barradas Nuno, Alves Eduardo, Buljan Maja, Bernstorff Sigrid, Kashtiban Reza, Bangert Ursel, Pinto Sara, Rolo Anabela, Chahboun Adil, Gomes Maria
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Online Access:http://www.nanoscalereslett.com/content/6/1/341
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spelling doaj-bba4a6257f1f4e5a9d054360e09a72f42020-11-24T22:20:15ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2011-01-0161341Low-temperature fabrication of layered self-organized Ge clusters by RF-sputteringBarradas NunoAlves EduardoBuljan MajaBernstorff SigridKashtiban RezaBangert UrselPinto SaraRolo AnabelaChahboun AdilGomes Maria<p>Abstract</p> <p>In this article, we present an investigation of (Ge + SiO<sub>2</sub>)/SiO<sub>2 </sub>multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Rutherford backscattering spectrometry, Raman, and X-ray photoelectron spectroscopies. We show a formation of self-assembled Ge clusters during the deposition at 250&#176;C. The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution. The crystallization of the clusters was achieved at annealing temperature of 700&#176;C.</p> http://www.nanoscalereslett.com/content/6/1/341
collection DOAJ
language English
format Article
sources DOAJ
author Barradas Nuno
Alves Eduardo
Buljan Maja
Bernstorff Sigrid
Kashtiban Reza
Bangert Ursel
Pinto Sara
Rolo Anabela
Chahboun Adil
Gomes Maria
spellingShingle Barradas Nuno
Alves Eduardo
Buljan Maja
Bernstorff Sigrid
Kashtiban Reza
Bangert Ursel
Pinto Sara
Rolo Anabela
Chahboun Adil
Gomes Maria
Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
Nanoscale Research Letters
author_facet Barradas Nuno
Alves Eduardo
Buljan Maja
Bernstorff Sigrid
Kashtiban Reza
Bangert Ursel
Pinto Sara
Rolo Anabela
Chahboun Adil
Gomes Maria
author_sort Barradas Nuno
title Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
title_short Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
title_full Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
title_fullStr Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
title_full_unstemmed Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering
title_sort low-temperature fabrication of layered self-organized ge clusters by rf-sputtering
publisher SpringerOpen
series Nanoscale Research Letters
issn 1931-7573
1556-276X
publishDate 2011-01-01
description <p>Abstract</p> <p>In this article, we present an investigation of (Ge + SiO<sub>2</sub>)/SiO<sub>2 </sub>multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Rutherford backscattering spectrometry, Raman, and X-ray photoelectron spectroscopies. We show a formation of self-assembled Ge clusters during the deposition at 250&#176;C. The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution. The crystallization of the clusters was achieved at annealing temperature of 700&#176;C.</p>
url http://www.nanoscalereslett.com/content/6/1/341
work_keys_str_mv AT barradasnuno lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT alveseduardo lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT buljanmaja lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT bernstorffsigrid lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT kashtibanreza lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT bangertursel lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT pintosara lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT roloanabela lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT chahbounadil lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
AT gomesmaria lowtemperaturefabricationoflayeredselforganizedgeclustersbyrfsputtering
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