Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering

Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering

<p>Abstract</p> <p>In this article, we present an investigation of (Ge + SiO<sub>2</sub>)/SiO<sub>2 </sub>multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transm...

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Bibliographic Details
Main Authors: Barradas Nuno, Alves Eduardo, Buljan Maja, Bernstorff Sigrid, Kashtiban Reza, Bangert Ursel, Pinto Sara, Rolo Anabela, Chahboun Adil, Gomes Maria
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Online Access:http://www.nanoscalereslett.com/content/6/1/341

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http://www.nanoscalereslett.com/content/6/1/341

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