THE EFFECT OF CH₄ PLASMA TREATMENT ON LOW DIELECTRIC HSQ FILMS
The commercial hydrogen silsesquioxane (HSQ) is made up from low-density and low dielectric constant (low-k) materials. In this paper, low-k HSQ films are obtained by spin-on deposition (SOD) and then followed by treatment with CH₄ plasma using electron cyclotron resonance (ECR). Fourier-transform i...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
University of Chemistry and Technology, Prague
2018-08-01
|
| Series: | Ceramics-Silikáty |
| Subjects: | |
| Online Access: |
http://www.ceramics-silikaty.cz/index.php?page=cs_detail_doi&id=1225
|