Preparation and study of nanostructured TiAlSiN thin films

Preparation and study of nanostructured TiAlSiN thin films

TiAlSiN thin film coatings were deposited by DC reactive magnetron sputtering of TiAlSi target with 40 at.% Ti, 40 at.% Al and 20 at.% Si, performed in N2-Ar gas mixture. The sputtering power used in these experiments was controlled for 400 W. The bias voltage of the substrates was kept at -20 V DC...

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Bibliographic Details
Main Authors: Jakab-Farkas L., Papp S., G. Strnad, Safran Gy., I. Vida-Simiti, Biró D.
Format: Article
Language:English
Published: Editura Universităţii "Petru Maior" 2011-12-01
Series:Scientific Bulletin of the ''Petru Maior" University of Tîrgu Mureș
Subjects:
thin film
sputtering
microstructure
mechanical properties
Online Access:http://scientificbulletin.upm.ro/papers/2011/12/Jakab-Farkas-L.-Papp-S.-Strnad-G.-Safran-Gy.-Vida-Simiti-I.-Bir%C3%B3-D.-Preparation-and-study-of-nanostructured-TiAlSiN-thin-films1.pdf

Internet

http://scientificbulletin.upm.ro/papers/2011/12/Jakab-Farkas-L.-Papp-S.-Strnad-G.-Safran-Gy.-Vida-Simiti-I.-Bir%C3%B3-D.-Preparation-and-study-of-nanostructured-TiAlSiN-thin-films1.pdf

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