Sputtered Silicon as a Potential Masking Material for Glass Micromachining – A Feasibility Study
Present paper reports use of sputtered silicon as a masking material for glass micromachining with hydrofluoric acid (HF) as an etchant. A film of sputtered silicon (sp-Si) having thickness of ~1.4 mm was deposited on glass substrate using DC sputtering system. Sp-Si was patterned using standard pho...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
IFSA Publishing, S.L.
2009-04-01
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| Series: | Sensors & Transducers |
| Subjects: | |
| Online Access: | http://www.sensorsportal.com/HTML/DIGEST/april_09/P_422.pdf |