Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography

Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography

Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an...

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Bibliographic Details
Main Authors: Chiara Valsecchi, Luis Enrique Gomez Armas, Jacson Weber de Menezes
Format: Article
Language:English
Published: MDPI AG 2019-05-01
Series:Sensors
Subjects:
holography
optics at surfaces
surface plasmons
subwavelength structures
nanostructures
biological sensing and sensors
Online Access:https://www.mdpi.com/1424-8220/19/9/2182

Internet

https://www.mdpi.com/1424-8220/19/9/2182

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