Plasma Parameters and Etching Characteristics of SiO<sub>x</sub>N<sub>y</sub> Films in CF<sub>4</sub> + O<sub>2</sub> + X (X = C<sub>4</sub>F<sub>8</sub> or CF<sub>2</sub>Br<sub>2</sub>) Gas Mixtures
In this work, we carried out the study of CF<sub>4</sub> + O<sub>2</sub> + X (X = C<sub>4</sub>F<sub>8</sub> or CF<sub>2</sub>Br<sub>2</sub>) gas chemistries in respect to the SiO<sub>x</sub>N<sub>y</sub>...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-12-01
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| Series: | Materials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1996-1944/13/23/5476 |