Al2O3 on WSe2 by ozone based atomic layer deposition: Nucleation and interface study
In this work, the atomic layer deposition process using ozone and trimethylaluminum (TMA) for the deposition of Al2O3 films on WSe2 was investigated. It was found that the ozone-based atomic layer deposition enhanced the nucleation of Al2O3 in comparison to the water/TMA process. In addition, the ch...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2017-08-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.4992120 |