Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis

This paper presents a method to improve the alignment accuracy of a mask in linear scale projection lithography, in which the adjacent pixel gray square variance method is applied to a charge-coupled device (CCD) image to obtain the best position of the focal length of the motherboard and then reali...

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Bibliographic Details
Main Authors: Dongxu Ren, Zexiang Zhao, Jianpu Xi, Bin Li, Zhengfeng Li, Huiying Zhao, Lujun Cui, Hang Xu
Format: Article
Language:English
Published: MDPI AG 2018-07-01
Series:Sensors
Subjects:
Online Access:http://www.mdpi.com/1424-8220/18/8/2442