Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis
This paper presents a method to improve the alignment accuracy of a mask in linear scale projection lithography, in which the adjacent pixel gray square variance method is applied to a charge-coupled device (CCD) image to obtain the best position of the focal length of the motherboard and then reali...
Main Authors: | , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-07-01
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Series: | Sensors |
Subjects: | |
Online Access: | http://www.mdpi.com/1424-8220/18/8/2442 |