Multiple-Node Charge Collection in 65 nm Technology Triple-Well SRAMs
The conventional CMOS fabrication process can be either a dual-well technology or a triple-well technology. Triple-well technology has been shown to be superior to dualwell technology in terms of electrical performance. However, for advanced deep-sub-micron technologies, reliability concerns over so...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Institute of Technology, Nirma University
2000-01-01
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| Series: | Nirma University Journal of Engineering and Technology |
| Online Access: | http://nujet.org.in/index.php/nujet/article/view/105 |