ITO/SiO<sub>2</sub>/ITO Structure on a Sapphire Substrate Using the Oxidation of Ultra-Thin Si Films as an Insulating Layer for One-Glass-Solution Capacitive Touch-Screen Panels

ITO/SiO<sub>2</sub>/ITO Structure on a Sapphire Substrate Using the Oxidation of Ultra-Thin Si Films as an Insulating Layer for One-Glass-Solution Capacitive Touch-Screen Panels

The SiO<sub>2</sub> generated by low-temperature oxidation of ultra-thin metallic silicon (thickness = 50 nm) film was evaluated for implementation in one-glass-solution capacitive touch-screen panels (OGS-TSPs) on sapphire-based substrates. Our results show that the silicon films oxidiz...

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Bibliographic Details
Main Authors: Shin Yong Joo, Chadrasekhar Loka, Young Woong Jo, Maddipatla Reddyprakash, Sung Whan Moon, YiSik Choi, Seong Eui Lee, Gue Serb Cho, Kee-Sun Lee
Format: Article
Language:English
Published: MDPI AG 2020-02-01
Series:Coatings
Subjects:
thin film: sputtering
ito
sio<sub>2</sub>
low-temperature oxidation
touch screen panel
sapphire
transmittance
Online Access:https://www.mdpi.com/2079-6412/10/2/134

Internet

https://www.mdpi.com/2079-6412/10/2/134

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