The effects of carbon incorporation on the refractive index of PECVD silicon oxide layers

The effects of carbon incorporation on the refractive index of PECVD silicon oxide layers

Silicon oxide (SiOx) has many applications, including as a low-refractive index material. Plasma enhanced chemical vapor deposition (PECVD) processes are facile, low temperature routes to produce thin SiOx layers. A route to decrease the refractive index of SiOx films is to increase the layer porosi...

Full description

Bibliographic Details
Main Authors: Benjamin Torda, Lazhar Rachdi, Asmaa Mohamed Okasha Mohamed Okasha, Pierre Saint-Cast, Marc Hofmann
Format: Article
Language:English
Published: AIP Publishing LLC 2020-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5142017

Internet

http://dx.doi.org/10.1063/1.5142017

Similar Items