Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

• Main Authors: Jun Zhao, Bettina Frank, Frank Neubrech, Chunjie Zhang, Paul V. Braun, Harald Giessen
• Format: Article
• Language: English
• Published: Beilstein-Institut 2014-05-01
• Series: Beilstein Journal of Nanotechnology
• Subjects: hole-mask colloidal nanolithography; localized surface plasmon resonance sensing; low-cost large-area plasmonic nanostructures; multilayer fabrication; surface-enhanced infrared absorption spectroscopy (SERS)
• Online Access: https://doi.org/10.3762/bjnano.5.68

Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.