Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials
Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication proces...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Beilstein-Institut
2014-05-01
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| Series: | Beilstein Journal of Nanotechnology |
| Subjects: | |
| Online Access: | https://doi.org/10.3762/bjnano.5.68 |