Two-step Fabrication of Large Area SiO2/Si Membranes

Two-step Fabrication of Large Area SiO2/Si Membranes

Two-step fabrication technique of SiO<sub>2</sub>/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon &lt;100&gt; wafer in tetramethylammonium hydroxide (TMAH) water solution and SF<sub>6</sub>/O<sub>2</sub>...

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Bibliographic Details
Main Authors: Viktoras GRIGALIŪNAS, Brigita ABAKEVIČIENĖ, Ignas GRYBAS, Angelė GUDONYTĖ, Vitoldas KOPUSTINSKAS, Darius VIRŽONIS, Ramūnas NAUJOKAITIS, Sigitas TAMULEVIČIUS
Format: Article
Language:English
Published: Kaunas University of Technology 2012-12-01
Series:Medžiagotyra
Subjects:
SiO2/Si membrane
TMAH etching
reactive ion etching
surface roughness
Online Access:http://matsc.ktu.lt/index.php/MatSc/article/view/3090

Internet

http://matsc.ktu.lt/index.php/MatSc/article/view/3090

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