The Role of the Molecular Hydrogen Formation in the Process of Metal-Ion Reduction on Multicrystalline Silicon in a Hydrofluoric Acid Matrix

Metal deposition on silicon in hydrofluoric acid (HF) solutions is a well-established process for the surface patterning of silicon. The reactions behind this process, especially the formation or the absence of molecular hydrogen (H<sub>2</sub>), are controversially discussed in the lite...

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Bibliographic Details
Main Authors: Stefan Schönekerl, Jörg Acker
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/11/4/982