Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

Absorbance-Modulation-Optical Lithography (AMOL) has been previously demonstrated to be able to confine light to deep sub-wavelength dimensions and thereby, enable patterning of features beyond the diffraction limit. In AMOL, a thin photochromic layer that converts between two states via light expos...

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Bibliographic Details
Main Authors: Apratim Majumder, Xiaowen Wan, Farhana Masid, Benjamin J. Pollock, Trisha L. Andrew, Olivier Soppera, Rajesh Menon
Format: Article
Language:English
Published: AIP Publishing LLC 2016-06-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4954178

Internet

http://dx.doi.org/10.1063/1.4954178

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