Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties

Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties

Abstract The low-dimensional, highly anisotropic geometries, and superior mechanical properties of one-dimensional (1D) nanomaterials allow the exquisite strain engineering with a broad tunability inaccessible to bulk or thin-film materials. Such capability enables unprecedented possibilities for pr...

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Bibliographic Details
Main Authors: Yixiu Wang, Shengyu Jin, Qingxiao Wang, Min Wu, Shukai Yao, Peilin Liao, Moon J. Kim, Gary J. Cheng, Wenzhuo Wu
Format: Article
Language:English
Published: SpringerOpen 2020-08-01
Series:Nano-Micro Letters
Subjects:
Chiral semiconductor
Nanowires
Nanoimprinting
Strain engineering
Optical property
Online Access:http://link.springer.com/article/10.1007/s40820-020-00493-3

Internet

http://link.springer.com/article/10.1007/s40820-020-00493-3

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