FEA-based heat management of a monochromator at the High Energy Photon Source
The finite element method (FEA) was used for thermal mechanical behavior analysis of a monochromator subjected to high heat load for a beamline at the High Energy Photon Source (HEPS). Without using reflection mirror, high energy photons deposit directly on the first crystal of DCM (Double Crystal M...
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2019-08-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5109807 |