The importance of ions in low pressure PECVD plasmas
Plasma enhanced chemical vapour deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechanisms by which PECVD films grow are not well understood. Moreover, the species which contribu...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Frontiers Media S.A.
2015-02-01
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| Series: | Frontiers in Physics |
| Subjects: | |
| Online Access: | http://journal.frontiersin.org/Journal/10.3389/fphy.2015.00003/full |