Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry

Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry

We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology...

Full description

Bibliographic Details
Main Authors: Michael J. Brett, Jaron G. Van Dijken
Format: Article
Language:English
Published: MDPI AG 2012-08-01
Series:Molecules
Subjects:
phthalocyanine dyes
vapor phase processes
dry etching
nanopillar formation
Online Access:http://www.mdpi.com/1420-3049/17/9/10119

Internet

http://www.mdpi.com/1420-3049/17/9/10119

Similar Items