Variational Level-set Formulation for Lithographic Source and Mask Optimization
This paper addresses the contributing factors in lithographic source and mask optimization, namely, the accuracy of the image formation model and the efficiency of the inverse imaging calculations in the optimization framework. A variational level-set formulation is established to incorporate a dist...
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| Format: | Article |
| Language: | English |
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JommPublish
2018-12-01
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| Series: | Journal of Microelectronic Manufacturing |
| Subjects: | |
| Online Access: | http://www.jommpublish.org/p/19/ |