Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth
Sputter deposition is a widely used growth technique for a large range of important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2016-08-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.4961503 |