Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering

Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering

Abstract Tantalum nitride (TaNx) thin films were grown utilizing an inductively coupled plasma (ICP) assisted direct current (DC) sputtering, and 20–100% improved microhardness values were obtained. The detailed microstructural changes of the TaNx films were characterized utilizing transmission elec...

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Bibliographic Details
Main Authors: Sung-Il Baik, Young-Woon Kim
Format: Article
Language:English
Published: SpringerOpen 2020-02-01
Series:Applied Microscopy
Subjects:
Tantalum nitride (TaN)
Inductively coupled plasma (ICP)
Transition metals
Thin film
Microstructure
Transmission electron microscopy (TEM)
Online Access:https://doi.org/10.1186/s42649-020-00026-7

Internet

https://doi.org/10.1186/s42649-020-00026-7

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